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Engineering electronic structure of a 2D topological insulator Bi(111) bilayer on Sb nanofilms by quantum confinement effect

机译:二维拓扑绝缘体Bi(111)的工程电子结构   通过量子限制效应在sb纳米薄膜上生成双层

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摘要

We report on fabrication of a two-dimensional topological insulator-Bi(111)bilayer on Sb nanofilms via a sequential molecular beam epitaxy (MBE) growthtechnique. Our angle-resolved photoemission measurements demonstrate theevolution of the electronic band structure of the heterostructure as a functionof the film thickness and reveal the existence of a two-dimensional spinfulmassless electron gas within the top Bi bilayer. Interestingly, Ourfirst-principles calculation extrapolating the observed band structure showsthat, by tuning down the thickness of the supporting Sb films into the quantumdimension regime, a pair of isolated topological edge states emerges in apartial energy gap at 0.32 eV above the Fermi level as a consequence of quantumconfinement effect. Our results and methodology of fabricating nanoscaleheterostructures establish the Bi bilayer/Sb heterostructure as a platform ofgreat potential for both ultralow-energy-cost electronics and surface-basedspintronics.
机译:我们报告通过顺序分子束外延(MBE)生长技术在Sb纳米膜上的二维拓扑绝缘体Bi(111)双分子层的制造。我们的角度分辨光发射测量结果表明,异质结构的电子能带结构随薄膜厚度的变化而变化,并揭示了顶部Bi双层中存在二维无自旋无质量电子气。有趣的是,我们的第一性原理计算外推观察到的能带结构,结果表明,通过将支撑Sb薄膜的厚度减小到量子尺寸范围,结果在费米能级以上0.32 eV处的能隙中出现了一对孤立的拓扑边缘态量子限制效应。我们制造纳米级异质结构的结果和方法将Bi双层/ Sb异质结构确立为超低能耗电子产品和基于表面的自旋电子学具有巨大潜力的平台。

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